e-Repository BATAN

Advanced Search

Effect of deposition time of sputtering Ag-Cu thin film on mechanical and antimicrobial properties

Purniawan, A. and Hermastuti, R. and Purwaningsih, H and Atmono, Trimardji (2018) Effect of deposition time of sputtering Ag-Cu thin film on mechanical and antimicrobial properties. In: AIP Conference.

[img] Text (Effect of deposition time of sputtering Ag-Cu thin film on mechanical and antimicrobial properties)
1.5030230 - Published Version
Available under License Creative Commons Attribution No Derivatives.

Download (114kB)

Abstract

Metallic implants are important components in biomedical treatment. However, post-surgery infection often occurs after installation of implant. The infections are usually treated by antibiotics, but it still causes several secondary problems. As a prevention treatment, the surgical instruments and implants must be in a sterile condition. This action is still not optimal too because the material still can attract the bacteria. From material science point of view, it can be anticipated by developing a type of material which has antibacterial properties or called antimicrobial material. Silver (Ag) and Copper (Cu) have antimicrobial properties to prevent the infection. In this research, the influence of deposition time of Ag-Cu thin film deposition process as antimicrobial material with Physical Vapor Deposition (PVD) RF Sputtering method was analyzed. Deposition time used were for 10, 15 and 20 minutes in Argon gas pressure around 3 x 10-2 mbar in during deposition process. The morphology and surface roughness of Ag-Cu thin film were characterized using SEM and AFM. Based on the results, the deposition time influences the quality morphology that the thin films have good homogeneity and complete structure for longer deposition time. In addition, from roughness measurement results show that increase deposition time decrease the roughness of thin film. Antimicrobial performance was analyzed using Kirby Bauer Test. The results show that all of sample have good antimicrobial inhibition. Adhesion quality was evaluated using Rockwell C Indentation Test. However, the results indicate that the Ag-Cu thin film has low adhesion strength.

Item Type: Conference or Workshop Item (Paper)
Subjects: Isotop dan Radiasi > Produksi Isotop dan Sumber Radiasi > Akselerator
Rekayasa Perangkat dan Fasilitas Nuklir
Divisions: Pusat Sains dan Teknologi Akselerator
Depositing User: EDITOR PSTA BATAN
Date Deposited: 03 Jun 2018 08:59
Last Modified: 03 Jun 2018 08:59
URI: http://repo-nkm.batan.go.id/id/eprint/2754

Actions (login required)

View Item View Item